WPI Microfabrication Lab
The BME-MFL is located in the basement of Gateway Park, room 0122. It contains photolithography and microscopy equipment suitable for additive and subtractive fabrication of materials including silicon, glass, Au, ITO, etc. The MFL is available for student use following training and application, and is used in graduate (BME 555: BioMEMS and Tissue Microengineering) and undergraduate (BME 360X: Microfluidics Laboratory) courses.
Micropatterned cell culture
Equipment
- Photoresist spinner (Laurell )
- Digital hotplates, 7″ and 10″ (Dataplate 720 and 732)
- Exposure system (Kloe UV-KUB)
- Dektak 3 profilometer
- Stereo microscope (Zeiss Stemi 2000)- transmission and reflectance
- Plasma cleaners (Harrick PDC-32 and LF-5)
- Fume hood
- Clean bench
- Development station
- Nitrogen gun
Protocols
- SU-8 photoresists for high aspect ratio (10:1) photolithography (Optimal Thickness: 10-200 um)
- AZ1518 and S1813 positive photoresists for thin film photolithography (Optimal Thickness: 0.1-10 um)
- Si Anisotropic Etching (Au Mask)
- ITO Etching
- Glass Etching
File templates for mask printing, a project order form, and project pricing can be obtained by contacting Vanessa Kamara
For access, please contact Prof. Albrecht